The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Apr. 05, 2010
Hitoshi Kato, Iwate, JP;
Manabu Honma, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Yu Wamura, Iwate, JP;
Jun Ogawa, Iwate, JP;
Hitoshi Kato, Iwate, JP;
Manabu Honma, Iwate, JP;
Hiroyuki Kikuchi, Iwate, JP;
Yu Wamura, Iwate, JP;
Jun Ogawa, Iwate, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a substrate processing apparatus, a film deposition device and a heat processing device to perform an anneal processing are airtightly connected to a vacuum conveying chamber, and a substrate rotating unit to cause a substrate to rotate around a vertical axis is provided in the vacuum conveying chamber. A control unit is arranged to stop a relative rotation of a plurality of reactive gas supplying units, a separating gas supplying unit and a table by a rotation device in the middle of a film deposition process of the substrate, cause a conveying unit to take out the substrate from a vacuum chamber, and output a control signal that causes a substrate rotating unit to change a direction of the substrate.