The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Dec. 21, 2011
Satoru Tanaka, Koshi, JP;
Takehiko Orii, Nirasaki, JP;
Hirotaka Maruyama, Koshi, JP;
Teruomi Minami, Koshi, JP;
Mitsunori Nakamori, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Takehiko Orii, Nirasaki, JP;
Hirotaka Maruyama, Koshi, JP;
Teruomi Minami, Koshi, JP;
Mitsunori Nakamori, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An apparatus comprising: a processing liquid supply unit; a volatile processing liquid supply unit; a substrate heating unit; and a controller to control the volatile processing liquid supply unit and the substrate heating unit, wherein the controller executes a process of supplying the processing liquid to the substrate, a process of heating the substrate on which a liquid film of the processing liquid is formed, a process of supplying a volatile processing liquid, a process of stopping the supply of the volatile processing liquid, and a process of drying the substrate by removing the volatile processing liquid, and wherein the process of heating the substrate starts before the process of supplying the volatile processing liquid, and the substrate heating unit heats the substrate so that the surface temperature of the substrate is higher than a dew point before the surface of the substrate is exposed from the volatile processing liquid.