The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Feb. 11, 2013
Nuflare Technology, Inc., Numazu-shi, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A multi charged particle beam writing apparatus according to the present invention includes an aperture member, in which a plurality of openings are formed, to form multiple beams, a blanking plate having a plurality of blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a blanking aperture member to block each of beams which were deflected to be in a beam off state by the plurality of blankers, a plural stage objective lens to focus multiple beams having passed through the blanking aperture member onto the target object and a plurality of electrostatic lenses, at least one of which is arranged at each stage of the plural stage objective lens, to dynamically correct defocusing of the multiple beams during writing.