The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jul. 13, 2011
Arie Jeffrey Den Boef, Waalre, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Andreas Fuchs, Meerbusch, DE;
Martyn John Coogans, Eindhoven, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Stephen Peter Morgan, Son en Breugel, NL;
Michael Kubis, Dresden, DE;
Arie Jeffrey Den Boef, Waalre, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Andreas Fuchs, Meerbusch, DE;
Martyn John Coogans, Eindhoven, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Stephen Peter Morgan, Son en Breugel, NL;
Michael Kubis, Dresden, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p, pand the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.