The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Aug. 25, 2010
Biow-hiem Ong, Singapore, SG;
Rick Lai, Taichung, TW;
Chih-chiang Tu, Tauyen, TW;
Chia-shih Lin, Hsinchu, TW;
Jong-yuh Chang, Jhubei, TW;
Biow-Hiem Ong, Singapore, SG;
Rick Lai, Taichung, TW;
Chih-Chiang Tu, Tauyen, TW;
Chia-Shih Lin, Hsinchu, TW;
Jong-Yuh Chang, Jhubei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides a method of inspecting a photolithographic mask wherein a design database is received, and a feature of the design database is adjusted by a bias factor to produce a biased database. Image rendering is performed on the biased database to produce a biased image. A mask is also created using the design database, and the mask is imaged to produce a mask image. The biased image is compared to the mask image, and a new value for the bias factor may be determined based on the comparison.