The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Jul. 26, 2010
Yasunari Sohda, Kawasaki, JP;
Takeyoshi Ohashi, Tokyo, JP;
Muneyuki Fukuda, Kokubunji, JP;
Toru Yamanashi, Kakamigahara, JP;
Hiromasa Yamanashi, Tokyo, JP;
Yasunari Sohda, Kawasaki, JP;
Takeyoshi Ohashi, Tokyo, JP;
Muneyuki Fukuda, Kokubunji, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.