The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jul. 21, 2009
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Erik Roelof Loopstra, Eindhoven, NL;
Vladimir Mihailovitch Krivtsun, Moscow, RU;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Dzmitry Labetski, Utrecht, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Vladimir Vitalevich Ivanov, Moscow, RU;
Erik Roelof Loopstra, Eindhoven, NL;
Vladimir Mihailovitch Krivtsun, Moscow, RU;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Dzmitry Labetski, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.