Abnormality detection system, abnormality detection method, recording medium, and substrate processing apparatus

Abstract

Disclosed is an abnormality detection system that accurately detects abnormalities that arise in a device. The abnormality detection system, which detects abnormalities that arise in a plasma processing device, is provided with: a plurality of ultrasonic sensors, which detects acoustic emissions (AE), which cause abnormalities to arise; a distributor, which distributes each output signal from the ultrasonic sensorsinto a first signal and a second signal; a trigger, which samples the first signal at, for example, 10 kHz, and generates a trigger signal when predetermined characteristics are detected; a trigger generation time counter, which receives trigger signals and determines the time of trigger generation; a data logger board, which creates sampling data from sampling the second signal at, for example, 1 MHz; and a PC, which analyzes abnormalities arising in the plasma processing deviceby means of performing a waveform analysis of data from the sampling data, said data corresponding to a set time period using the time of trigger generation determined by the trigger generation time counteras a benchmark.