The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2014

Filed:

Apr. 25, 2012
Applicants:

Torben Kelwing, Dresden, DE;

Martin Trentzsch, Dresden, DE;

Boris Bayha, Dresden, DE;

Carsten Grass, Dresden, DE;

Richard Carter, Dresden, DE;

Inventors:

Torben Kelwing, Dresden, DE;

Martin Trentzsch, Dresden, DE;

Boris Bayha, Dresden, DE;

Carsten Grass, Dresden, DE;

Richard Carter, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
Abstract

When forming high-k metal gate electrode structures by providing the gate dielectric material in an early manufacturing stage, the heat treatment or anneal process may be applied after incorporating work function metal species and prior to capping the gate dielectric material with a metal-containing electrode material. In this manner, the CET for a given physical thickness for the gate dielectric layer may be significantly reduced.


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