The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Mar. 14, 2011
Tsuyoshi Moriya, Nirasaki, JP;
Takahiro Murakami, Miyagi-gun, JP;
Yoshiyuki Kobayashi, Nirasaki, JP;
Tetsuji Sato, Nirasaki, JP;
Eiichi Sugawara, Nirasaki, JP;
Shosuke Endoh, Nirasaki, JP;
Masaki Fujimori, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Takahiro Murakami, Miyagi-gun, JP;
Yoshiyuki Kobayashi, Nirasaki, JP;
Tetsuji Sato, Nirasaki, JP;
Eiichi Sugawara, Nirasaki, JP;
Shosuke Endoh, Nirasaki, JP;
Masaki Fujimori, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile