The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
May. 29, 2012
Deyan Wang, Hudson, MA (US);
Chunyi Wu, Shrewsbury, MA (US);
Cong Liu, Shrewsbury, MA (US);
Gerhard Pohlers, Needham, MA (US);
Cheng-bai Xu, Southborough, MA (US);
George G. Barclay, Jefferson, MA (US);
Deyan Wang, Hudson, MA (US);
Chunyi Wu, Shrewsbury, MA (US);
Cong Liu, Shrewsbury, MA (US);
Gerhard Pohlers, Needham, MA (US);
Cheng-bai Xu, Southborough, MA (US);
George G. Barclay, Jefferson, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ris independently H, F, Calkyl, or Cfluoroalkyl, Lis a straight chain or branched Calkylene group, or a monocyclic, polycyclic, or fused polycyclic Ccycloalkylene group, each Ris independently H, Calkyl, Ccycloalkyl, Cheterocycloalkyl, an aliphatic Coxycarbonyl, or a Cacyl group optionally including a heteroatom substituent group, where each Ris separate or at least one Ris attached to an adjacent R; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic Cheterocycloalkylene group, and X is H, Calkyl, aliphatic Coxycarbonyl, or a Cacyl group optionally including a heteroatom substituent group; and each Ris independently Calkyl, Ccycloalkyl, or Cheterocycloalkyl, wherein each Ris separate or at least one Ris attached to an adjacent R.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile