The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Jul. 25, 2011
Toshiyuki Ikeuchi, Yamanashi, JP;
Pao-hwa Chou, Yamanashi, JP;
Kazuya Yamamoto, Yamanashi, JP;
Kentaro Sera, Yamanashi, JP;
Toshiyuki Ikeuchi, Yamanashi, JP;
Pao-Hwa Chou, Yamanashi, JP;
Kazuya Yamamoto, Yamanashi, JP;
Kentaro Sera, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A disclosed film deposition method comprises alternately repeating an adsorption step and a reaction step with an interval period therebetween. The adsorption step includes opening a first on-off valve of a source gas supplying system for a predetermined time period thereby to supply a source gas to a process chamber, closing the first valve after the predetermined time period elapses, and confining the source gas within the process tube, thereby allowing the source gas to be adsorbed on an object to be processed, while a third on-off valve of a vacuum evacuation system is closed. The reaction step includes opening a second on-off valve of a reaction gas supplying system thereby to supply a reaction gas to the process chamber, thereby allowing the source gas and the reaction gas to react with each other thereby to produce a thin film on the object to be processed.