The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Apr. 13, 2011
Chien-hung Lai, Taichung, TW;
Biow-hiem Ong, Singapore, SG;
Chia-shih Lin, Hsinchu, TW;
Jong-yuh Chang, Jhubei, TW;
Chih-chiang Tu, Tauyen, TW;
Chien-Hung Lai, Taichung, TW;
Biow-Hiem Ong, Singapore, SG;
Chia-Shih Lin, Hsinchu, TW;
Jong-Yuh Chang, Jhubei, TW;
Chih-Chiang Tu, Tauyen, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.