The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Apr. 16, 2012
Hung-chun Wang, Taichung, TW;
Ming-hui Chih, Luzhou, TW;
Cheng Kun Tsai, Hsinchu, TW;
Wen-chun Huang, Tainan, TW;
Ru-gun Liu, Zhubei, TW;
Hung-Chun Wang, Taichung, TW;
Ming-Hui Chih, Luzhou, TW;
Cheng Kun Tsai, Hsinchu, TW;
Wen-Chun Huang, Tainan, TW;
Ru-Gun Liu, Zhubei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a plurality of IC regions each including an IC pattern; performing a dissection process to the IC design layout; and performing a correction process to the IC design layout using a correction model that includes proximity effect and location effect. The correction process includes performing a first correction step to a first IC region of the IC regions, resulting in a first corrected IC pattern in the first IC region; and performing a second correction step to a second IC region of the IC regions, starting with the first corrected IC pattern, resulting in a second corrected IC pattern.