The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Dec. 08, 2009
Everhardus Cornelis Mos, Best, NL;
Mircea Dusa, Campbell, CA (US);
Jozef Maria Finders, Veldhoven, NL;
Christianus Gerardus Maria DE Mol, Son en Breugel, NL;
Scott Anderson Middlebrooks, Galveston, TX (US);
Dongzi Wangli, Veldhoven, NL;
Everhardus Cornelis Mos, Best, NL;
Mircea Dusa, Campbell, CA (US);
Jozef Maria Finders, Veldhoven, NL;
Christianus Gerardus Maria De Mol, Son en Breugel, NL;
Scott Anderson Middlebrooks, Galveston, TX (US);
Dongzi Wangli, Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.