The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2013

Filed:

Sep. 03, 2010
Applicants:

Anthony DE LA Llera, Fremont, CA (US);

Pratik Mankidy, Fremont, CA (US);

Michael C. Kellogg, Oakland, CA (US);

Rajinder Dhindsa, San Jose, CA (US);

Inventors:

Anthony de la Llera, Fremont, CA (US);

Pratik Mankidy, Fremont, CA (US);

Michael C. Kellogg, Oakland, CA (US);

Rajinder Dhindsa, San Jose, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); B23P 19/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.

Published as:
US2012055632A1; WO2012030382A2; TW201218270A; WO2012030382A3; SG188356A1; KR20130002985U; US8573152B2; JP3189241U; CN203481190U; KR200478781Y1; TWI533372B;

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