The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Aug. 04, 2010
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 'S-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Kolesnychenko, Nijmegen, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 'S-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor DE Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 'S-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Kolesnychenko, Nijmegen, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 'S-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.