The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
May. 03, 2012
Chiyan Kuan, Danville, CA (US);
Yi-xiang Wang, Fremont, CA (US);
Chung-shih Pan, Palo Alto, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Zhongwei Chen, San Jose, CA (US);
Chiyan Kuan, Danville, CA (US);
Yi-Xiang Wang, Fremont, CA (US);
Chung-Shih Pan, Palo Alto, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Zhongwei Chen, San Jose, CA (US);
Hermes Microvision Inc., Hsinchu, TW;
Abstract
The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.