The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Mar. 31, 2010
Arie Jeffrey Den Boef, Waalre, NL;
Harry Sewell, Ridgefield, CT (US);
Keith William Andresen, Wilton, CT (US);
Earl William Ebert, Jr., Oxford, CT (US);
Sanjeev Kumar Singh, Danbury, CT (US);
Arie Jeffrey Den Boef, Waalre, NL;
Harry Sewell, Ridgefield, CT (US);
Keith William Andresen, Wilton, CT (US);
Earl William Ebert, Jr., Oxford, CT (US);
Sanjeev Kumar Singh, Danbury, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.