The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Sep. 06, 2011
Hung-chun Wang, Ching-Suei, TW;
Tzu-chin Lin, Hsinchu, TW;
Nian-fuh Cheng, Hsinchu, TW;
Jeng-horng Chen, Hsin-Chu, TW;
Wen-chun Huang, Tainan, TW;
Ru-gun Liu, Hsinchu, TW;
Hung-Chun Wang, Ching-Suei, TW;
Tzu-Chin Lin, Hsinchu, TW;
Nian-Fuh Cheng, Hsinchu, TW;
Jeng-Horng Chen, Hsin-Chu, TW;
Wen-Chun Huang, Tainan, TW;
Ru-Gun Liu, Hsinchu, TW;
Abstract
The present disclosure involves a method of performing a maskless lithography process. The method includes receiving a computer layout file for an integrated circuit (IC) device. The layout file contains a plurality of IC sections. The method includes separating the computer layout file into a plurality of sub-files. The method includes striping the plurality of sub-files concurrently using a plurality of computer processors, thereby generating a plurality of striped sub-files. The method includes transferring the plurality of striped sub-files to a maskless lithography system.