The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Sep. 30, 2003
David L. O'meara, Poughkeepsie, NY (US);
Daniel Craig Burdett, West Park, NY (US);
Stephen H. Cabral, Pine Plains, NY (US);
Gert Leusink, Saltpoint, NY (US);
John William Kostenko, LaGrangeville, NY (US);
Cory Wajda, Hopewell Junction, NY (US);
David L. O'Meara, Poughkeepsie, NY (US);
Daniel Craig Burdett, West Park, NY (US);
Stephen H. Cabral, Pine Plains, NY (US);
Gert Leusink, Saltpoint, NY (US);
John William Kostenko, LaGrangeville, NY (US);
Cory Wajda, Hopewell Junction, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system are provided for monitoring status of a system component in a process chamber of a batch type processing system. The method includes exposing a system component to light from a light source and monitoring interaction of the light with the system component to determine status of the system component. The method can detect light transmission and/or light reflection from a system component during a process that can include a chamber cleaning process, a chamber conditioning process, a substrate etching process, and a substrate film formation process. The system component can be a consumable system part such as a process tube, a shield, a ring, a baffle, and a liner, and can further contain a protective coating.