The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Aug. 30, 2010
Carlo Cornelis Maria Luijten, Duizel, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Erik Roelof Loopstra, Heeze, NL;
Bob Streefkerk, Tilburg, NL;
Marcel Beckers, Eindhoven, NL;
Herman Boom, Eindhoven, NL;
Richard Moerman, Son, NL;
Carlo Cornelis Maria Luijten, Duizel, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Erik Roelof Loopstra, Heeze, NL;
Bob Streefkerk, Tilburg, NL;
Marcel Beckers, Eindhoven, NL;
Herman Boom, Eindhoven, NL;
Richard Moerman, Son, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.