The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
Jun. 07, 2011
Shigeru Nakajima, Yamanashi, JP;
Kazuhide Hasebe, Yamanashi, JP;
Pao-hwa Chou, Yamanashi, JP;
Mitsuaki Iwashita, Yamanashi, JP;
Reiji Niino, Yamanashi, JP;
Shigeru Nakajima, Yamanashi, JP;
Kazuhide Hasebe, Yamanashi, JP;
Pao-Hwa Chou, Yamanashi, JP;
Mitsuaki Iwashita, Yamanashi, JP;
Reiji Niino, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a micro pattern forming method including forming a thin film on a substrate; forming a film serving as a mask when processing the thin film; processing the film serving as a mask into a pattern including lines having a preset pitch; trimming the pattern including the lines; and forming an oxide film on the pattern including the lines and on the thin film by alternately supplying a source gas and an activated oxygen species. Here, the process of trimming the pattern and the process of forming an oxide film are consecutively performed in a film forming apparatus configured to form the oxide film.