The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Dec. 09, 2009
Liqun Han, Pleasanton, CA (US);
Marian Mankos, Palo Alto, CA (US);
Xinrong Jiang, Palo Alto, CA (US);
Rex Runyon, Fremont, CA (US);
John Greene, Santa Cruz, CA (US);
Liqun Han, Pleasanton, CA (US);
Marian Mankos, Palo Alto, CA (US);
Xinrong Jiang, Palo Alto, CA (US);
Rex Runyon, Fremont, CA (US);
John Greene, Santa Cruz, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.