The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2012

Filed:

Oct. 21, 2008
Applicants:

Deenesh Padhi, Sunnyvale, CA (US);

Chiu Chan, Foster City, CA (US);

Sudha Rathi, San Jose, CA (US);

Ganesh Balasubramanian, Sunnyvale, CA (US);

Jianhua Zhou, San Jose, CA (US);

Karthik Janakiraman, San Jose, CA (US);

Martin J. Seamons, San Jose, CA (US);

Visweswaren Sivaramakrishnan, Cupertino, CA (US);

Derek R. Witty, Fremont, CA (US);

Hichem M'saad, Santa Clara, CA (US);

Inventors:

Deenesh Padhi, Sunnyvale, CA (US);

Chiu Chan, Foster City, CA (US);

Sudha Rathi, San Jose, CA (US);

Ganesh Balasubramanian, Sunnyvale, CA (US);

Jianhua Zhou, San Jose, CA (US);

Karthik Janakiraman, San Jose, CA (US);

Martin J. Seamons, San Jose, CA (US);

Visweswaren Sivaramakrishnan, Cupertino, CA (US);

Derek R. Witty, Fremont, CA (US);

Hichem M'Saad, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/30 (2006.01); C23C 16/34 (2006.01); C23C 16/32 (2006.01); B05C 11/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

An article having a protective coating for use in semiconductor applications and methods for making the same are provided. In certain embodiments, a method of coating an aluminum surface of an article utilized in a semiconductor processing chamber is provided. The method comprises providing a processing chamber; placing the article into the processing chamber; flowing a first gas comprising a carbon source into the processing chamber; flowing a second gas comprising a nitrogen source into the processing chamber; forming a plasma in the chamber; and depositing a coating material on the aluminum surface. In certain embodiments, the coating material comprises an amorphous carbon nitrogen containing layer. In certain embodiments, the article comprises a showerhead configured to deliver a gas to the processing chamber.


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