The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2012

Filed:

Sep. 15, 2010
Applicants:

Shigehiro Hara, Kanagawa, JP;

Shuichi Tamamushi, Kanagawa, JP;

Takashi Kamikubo, Tokyo, JP;

Hitoshi Higurashi, Kanagawa, JP;

Shinji Sakamoto, Kanagawa, JP;

Yusuke Sakai, Kanagawa, JP;

Yoshihiro Okamoto, Kanagawa, JP;

Akihito Anpo, Tokyo, JP;

Inventors:

Shigehiro Hara, Kanagawa, JP;

Shuichi Tamamushi, Kanagawa, JP;

Takashi Kamikubo, Tokyo, JP;

Hitoshi Higurashi, Kanagawa, JP;

Shinji Sakamoto, Kanagawa, JP;

Yusuke Sakai, Kanagawa, JP;

Yoshihiro Okamoto, Kanagawa, JP;

Akihito Anpo, Tokyo, JP;

Assignee:

NuFlare Technology, Inc., Numazu-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.


Find Patent Forward Citations

Loading…