The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Feb. 18, 2010
Takumichi Sutani, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Hiroyuki Shindo, Hitachinaka, JP;
Takumichi Sutani, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Hiroyuki Shindo, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.