The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Apr. 11, 2008
Hui-jung Wu, Fremont, CA (US);
Kimberly Shafi, Boise, ID (US);
Kaushik Chattopadhyay, San Jose, ID (US);
Keith Fox, Portland, OR (US);
Tom Mountsier, San Jose, CA (US);
Girish Dixit, San Jose, CA (US);
Bart Van Schravendijk, Sunnyvale, CA (US);
Elizabeth Apen, West Linn, OR (US);
Hui-Jung Wu, Fremont, CA (US);
Kimberly Shafi, Boise, ID (US);
Kaushik Chattopadhyay, San Jose, ID (US);
Keith Fox, Portland, OR (US);
Tom Mountsier, San Jose, CA (US);
Girish Dixit, San Jose, CA (US);
Bart van Schravendijk, Sunnyvale, CA (US);
Elizabeth Apen, West Linn, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Provided are methods of stabilizing an underlying dielectric diffusion barrier during deposition and ultraviolet (UV) processing of an overlying dielectric layer. Methods include modulating the optical properties reduces the effects of UV radiation on the dielectric diffusion barrier layer. The dielectric diffusion barrier can be made to absorb less UV radiation. A dielectric layer with UV absorbing properties may also be added on top of the diffusion barrier layer so less UV is transmitted. Both methods result in reduced interaction between UV radiation and the dielectric diffusion barrier.