Boise, ID, United States of America

Kimberly Shafi


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Kimberly Shafi

Introduction

Kimberly Shafi is a notable inventor based in Boise, ID (US). She has made significant contributions to the field of materials science, particularly in the area of dielectric layers and their interaction with ultraviolet (UV) radiation. Her work has implications for various applications in semiconductor manufacturing and beyond.

Latest Patents

Kimberly Shafi holds 1 patent titled "Reducing UV and dielectric diffusion barrier interaction through the modulation of optical properties." This patent provides methods for stabilizing an underlying dielectric diffusion barrier during the deposition and UV processing of an overlying dielectric layer. The methods include modulating the optical properties to reduce the effects of UV radiation on the dielectric diffusion barrier layer. By making the dielectric diffusion barrier absorb less UV radiation, the interaction between UV radiation and the dielectric diffusion barrier is minimized. Additionally, a dielectric layer with UV absorbing properties may be added on top of the diffusion barrier layer to further reduce UV transmission.

Career Highlights

Kimberly Shafi has built a successful career at Novellus Systems Incorporated, where she has been instrumental in advancing technologies related to dielectric materials. Her innovative approaches have contributed to the development of more efficient manufacturing processes in the semiconductor industry.

Collaborations

Throughout her career, Kimberly has collaborated with talented professionals, including Hui-Jung Wu and Kaushik Chattopadhyay. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kimberly Shafi's contributions to the field of materials science and her innovative patent demonstrate her commitment to advancing technology. Her work continues to influence the semiconductor industry and showcases the importance of research and development in creating effective solutions.

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