The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Jun. 23, 2009
Ulrich Wegmann, Koenigsbronn, DE;
Uwe Schellhorn, Aalen, DE;
Joachim Stuehler, Aalen, DE;
Albrecht Ehrmann, Koenigsbronn, DE;
Martin Schriever, Aalen, DE;
Markus Goeppert, Aalen, DE;
Helmut Haidner, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Uwe Schellhorn, Aalen, DE;
Joachim Stuehler, Aalen, DE;
Albrecht Ehrmann, Koenigsbronn, DE;
Martin Schriever, Aalen, DE;
Markus Goeppert, Aalen, DE;
Helmut Haidner, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.