The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Dec. 18, 2009
Matt G. Goodman, Chandler, AZ (US);
Jereon Stoutyesdijk, Scottsdale, AZ (US);
Ravinder Aggarwal, Gilbert, AZ (US);
Mike Halpin, Scottsdale, AZ (US);
Tony Keeton, Mesa, AZ (US);
Mark Hawkins, Gilbert, AZ (US);
Lee Haen, Phoenix, AZ (US);
Armand Ferro, Phoenix, AZ (US);
Paul Brabant, Phoenix, AZ (US);
Robert Vyne, Gilbert, AZ (US);
Gregory M. Bartlett, Chandler, AZ (US);
Joseph P. Italiano, Phoenix, AZ (US);
Bob Haro, Gilbert, AZ (US);
Matt G. Goodman, Chandler, AZ (US);
Jereon Stoutyesdijk, Scottsdale, AZ (US);
Ravinder Aggarwal, Gilbert, AZ (US);
Mike Halpin, Scottsdale, AZ (US);
Tony Keeton, Mesa, AZ (US);
Mark Hawkins, Gilbert, AZ (US);
Lee Haen, Phoenix, AZ (US);
Armand Ferro, Phoenix, AZ (US);
Paul Brabant, Phoenix, AZ (US);
Robert Vyne, Gilbert, AZ (US);
Gregory M. Bartlett, Chandler, AZ (US);
Joseph P. Italiano, Phoenix, AZ (US);
Bob Haro, Gilbert, AZ (US);
ASM America, Inc., Phoenix, AZ (US);
Abstract
A substrate support system comprises a substrate holder having a plurality of passages extending between top and bottom surfaces thereof. The substrate holder supports a peripheral portion of the substrate backside so that a thin gap is formed between the substrate and the substrate holder. A hollow support member provides support to an underside of, and is configured to convey gas upward into one or more of the passages of, the substrate holder. The upwardly conveyed gas flows into the gap between the substrate and the substrate holder. Depending upon the embodiment, the gas then flows either outward and upward around the substrate edge (to inhibit backside deposition of reactant gases above the substrate) or downward through passages of the substrate holder, if any, that do not lead back into the hollow support member (to inhibit autodoping by sweeping out-diffused dopant atoms away from the substrate backside).