Phoenix, AZ, United States of America

Armand Ferro



Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 96(Granted Patents)


Company Filing History:


Years Active: 2001-2012

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7 patents (USPTO):

Title: Armand Ferro: Innovator in Chemical Vapor Deposition Technology

Introduction

Armand Ferro is a notable inventor based in Phoenix, AZ, who has made significant contributions to the field of chemical vapor deposition technology. With a total of 7 patents to his name, Ferro has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Ferro's latest patents include groundbreaking technologies such as the "In situ growth of oxide and silicon layers." This invention features a single-wafer, chemical vapor deposition reactor that utilizes hydrogen and silicon source gas for epitaxial silicon deposition. The reactor is designed to perform a sacrificial oxidation followed by a hydrogen bake, which sublimates the oxide and leaves a clean substrate for further epitaxial deposition. Additionally, a protective oxide can be formed over the epitaxial layer to prevent contamination. Another notable patent is the "Substrate support system for reduced autodoping and backside deposition." This system comprises a substrate holder that supports the substrate while allowing gas to flow upward, inhibiting unwanted backside deposition and autodoping.

Career Highlights

Ferro is currently employed at Asm America, Inc., where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in advancing the capabilities of chemical vapor deposition processes, making them more efficient and reliable.

Collaborations

Throughout his career, Ferro has collaborated with esteemed colleagues such as Ivo Johannes Raaijmakers and Derrick W Foster. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Armand Ferro's contributions to the field of chemical vapor deposition technology have established him as a leading inventor in the semiconductor industry. His innovative patents and collaborative efforts continue to shape the future of manufacturing processes.

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