The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Nov. 02, 2010
Akira Koshiishi, San Jose, CA (US);
Sathya Mani, Fremont, CA (US);
Gautam Bhattacharyya, San Ramon, CA (US);
Gregory R. Bettencourt, Fremont, CA (US);
Sandy Chao, Sunol, CA (US);
Akira Koshiishi, San Jose, CA (US);
Sathya Mani, Fremont, CA (US);
Gautam Bhattacharyya, San Ramon, CA (US);
Gregory R. Bettencourt, Fremont, CA (US);
Sandy Chao, Sunol, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.