The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Jun. 19, 2008
Keiya Saito, Hiratsuka, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Shunichi Matsumoto, Yokohama, JP;
Hidetoshi Nishiyama, Hitachinaka, JP;
Keiya Saito, Hiratsuka, JP;
Yasuhiro Yoshitake, Yokohama, JP;
Shunichi Matsumoto, Yokohama, JP;
Hidetoshi Nishiyama, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the existing defect on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.