The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Aug. 05, 2010
Christopher R. Hatem, Salisbury, MA (US);
Benjamin Colombeau, Salem, MA (US);
Thirumal Thanigaivelan, North Andover, MA (US);
Kyu-ha Shim, Andover, MA (US);
Dennis Rodier, Francestown, NH (US);
Christopher R. Hatem, Salisbury, MA (US);
Benjamin Colombeau, Salem, MA (US);
Thirumal Thanigaivelan, North Andover, MA (US);
Kyu-Ha Shim, Andover, MA (US);
Dennis Rodier, Francestown, NH (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
An improved method of performing pocket or halo implants is disclosed. The amount of damage and defects created by the halo implant degrades the performance of the semiconductor device, by increasing leakage current, decreasing the noise margin and increasing the minimum gate voltage. The halo or packet implant is performed at cold temperature, which decreases the damage caused to the crystalline structure and improves the amorphization of the crystal. The use of cold temperature also allows the use of lighter elements for the halo implant, such as boron or phosphorus.