The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2011
Filed:
Jan. 26, 2009
Shunji Maeda, Yokohama, JP;
Kenji Oka, Yokohama, JP;
Yukihiro Shibata, Fujisawa, JP;
Minoru Yoshida, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Yuji Takagi, Kamakura, JP;
Atsushi Yoshida, Yokohama, JP;
Kazuo Yamaguchi, Sagamihara, JP;
Shunji Maeda, Yokohama, JP;
Kenji Oka, Yokohama, JP;
Yukihiro Shibata, Fujisawa, JP;
Minoru Yoshida, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Yuji Takagi, Kamakura, JP;
Atsushi Yoshida, Yokohama, JP;
Kazuo Yamaguchi, Sagamihara, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.