The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Jun. 19, 2008
Georgiy O. Vaschenko, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Norbert R. Bowering, Bielefeld, DE;
David C. Brandt, Escondido, CA (US);
Alexander I. Ershov, Escondido, CA (US);
Rodney D. Simmons, San Diego, CA (US);
Oleh V. Khodykin, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Georgiy O. Vaschenko, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Norbert R. Bowering, Bielefeld, DE;
David C. Brandt, Escondido, CA (US);
Alexander I. Ershov, Escondido, CA (US);
Rodney D. Simmons, San Diego, CA (US);
Oleh V. Khodykin, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.