The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2010

Filed:

Dec. 30, 2005
Applicants:

Jiangqi He, Gilbert, AZ (US);

Robert L. Sankman, Phoenix, AZ (US);

Baoshu Xu, Shanghai, CN;

Xiang Yin Zeng, Shanghai, CN;

Inventors:

Jiangqi He, Gilbert, AZ (US);

Robert L. Sankman, Phoenix, AZ (US);

BaoShu Xu, Shanghai, CN;

Xiang Yin Zeng, Shanghai, CN;

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 27/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A spiral inductor is disposed above a substrate that includes two different materials. A dielectric film is the first material that provides structural integrity for the substrate. A second dielectric is the second material that provides a low dielectric-constant (low-K) material closest to the spiral inductor coil. A process of forming the spiral inductor includes patterning the substrate to allow a recess as a receptacle for the second dielectric, followed by forming the spiral inductor mostly above the second dielectric.


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