The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Feb. 14, 2007
Juan Dominguez, Hillsboro, OR (US);
Adrien Lavoie, Beaverton, OR (US);
John Plombon, Portland, OR (US);
Joseph Han, San Jose, CA (US);
Harsono Simka, Saratoga, CA (US);
David Thompson, Tonawanda, NY (US);
John Peck, Tonawanda, NY (US);
Juan Dominguez, Hillsboro, OR (US);
Adrien Lavoie, Beaverton, OR (US);
John Plombon, Portland, OR (US);
Joseph Han, San Jose, CA (US);
Harsono Simka, Saratoga, CA (US);
David Thompson, Tonawanda, NY (US);
John Peck, Tonawanda, NY (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Organometallic precursors and methods for deposition on a substrate in seed/barrier applications are herein disclosed. In some embodiments, the organometallic precursor is a ruthenium-containing, tantalum-containing precursor or combination thereof and may be deposited by atomic layer deposition, chemical vapor deposition and/or physical vapor deposition.