The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Feb. 16, 2007
Kenneth J. Bahng, Cupertino, CA (US);
Matthew Fenton Davis, Felton, CA (US);
Thorsten Lill, Santa Clara, CA (US);
Steven H. Kim, Union City, CA (US);
Kenneth J. Bahng, Cupertino, CA (US);
Matthew Fenton Davis, Felton, CA (US);
Thorsten Lill, Santa Clara, CA (US);
Steven H. Kim, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and system for removing volatile residues from a substrate are provided. In one embodiment, the volatile residues removal process is performed en-routed in the system while performing a halogen treatment process on the substrate. The volatile residues removal process is performed in the system other than the halogen treatment processing chamber and a FOUP. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a vacuum tight platform, processing a substrate in a processing chamber of the platform with a chemistry comprising halogen, and treating the processed substrate in the platform to release volatile residues from the treated substrate.