The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Sep. 08, 2006
Chang-cheng Hung, Jhubei, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Shih-ming Chang, Hsinchu, TW;
Wen-chuan Wang, Hsin-Chu, TW;
Chi-lun LU, Hsinchu, TW;
Allen Hsia, Hsin-Chu, TW;
Yen-bin Huang, Hsin-Chu, TW;
Chang-Cheng Hung, Jhubei, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Shih-Ming Chang, Hsinchu, TW;
Wen-Chuan Wang, Hsin-Chu, TW;
Chi-Lun Lu, Hsinchu, TW;
Allen Hsia, Hsin-Chu, TW;
Yen-Bin Huang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method for patterning a substrate includes forming a material layer on the substrate; performing a first etching on the material layer to form a pattern; measuring the pattern of the material layer using an optical spectrum metrology tool; determining whether the measuring indicates that the etching step achieved a predefined result; and producing an etching recipe and performing a second etching of the material layer using the etching recipe if the predefined result was not achieved.