The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Dec. 02, 2004
Yung-chih Chang, Fongshan, TW;
Cheng-i Sun, Taipei, TW;
Chun-i Kuo, Tainan, TW;
Fu-kun Yeh, Jhutian Hsiang, TW;
Hsueh-chi Shen, Hsinchu, TW;
Yung-Chih Chang, Fongshan, TW;
Cheng-I Sun, Taipei, TW;
Chun-I Kuo, Tainan, TW;
Fu-Kun Yeh, Jhutian Hsiang, TW;
Hsueh-Chi Shen, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A thermal process system. The thermal process system comprises a thermal processor, a metrology tool, and a controller. The thermal processor performs a thermal process as defined by a heating model to form a film on a wafer surface. The metrology tool, interfaced with the thermal processor, inspects thickness of the film. The controller, coupled with the thermal processor and the metrology tool, generates the heating model of the thermal processor and calibrates the heating model according to a preset slope coefficient matrix and the measured thickness.