The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Jun. 16, 2006
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Erik Roelof Loopstra, Heeze, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Yücel Kök, Veldhoven, NL;
Johannes Van ES, Zwolle, NL;
Herman Boom, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Erik Roelof Loopstra, Heeze, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Yücel Kök, Veldhoven, NL;
Johannes Van Es, Zwolle, NL;
Herman Boom, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.