The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Aug. 30, 2004
Steven Verhaverbeke, San Francisco, CA (US);
Jianshe Tang, San Jose, CA (US);
Roman Gouk, San Jose, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Han-wen Chen, Santa Clara, CA (US);
Ching-hwa Weng, Taipei County, TW;
James S. Papanu, San Rafael, CA (US);
Dennis Yost, Los Gatos, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
Jianshe Tang, San Jose, CA (US);
Roman Gouk, San Jose, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Han-Wen Chen, Santa Clara, CA (US);
Ching-Hwa Weng, Taipei County, TW;
James S. Papanu, San Rafael, CA (US);
Dennis Yost, Los Gatos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Cleaning solutions and cleaning methods targeted to particular substrates and structures in semiconductor fabrication are described. A method of cleaning fragile structures having a dimension less than 0.15 um with a cleaning solution formed of a solvent having a surface tension less than water while applying acoustic energy to the substrate on which the structures are formed is described. Also, a method of cleaning copper with several different cleaning solutions, and in particular an aqueous sulfuric acid and HF cleaning solution, is described. Also, methods of cleaning both sides of a substrate at the same time with different cleaning solutions applied to the top and the bottom are described.