The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Jan. 10, 2005
Applicants:

Glyn Braithwaite, Whitley Bay, GB;

Richard Hammond, Cardiff, GB;

Matthew Currie, Brookline, MA (US);

Inventors:

Glyn Braithwaite, Whitley Bay, GB;

Richard Hammond, Cardiff, GB;

Matthew Currie, Brookline, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Circuits for processing radio frequency ('RF') and microwave signals are fabricated using field effect transistors ('FETs') that have one or more strained channel layers disposed on one or more planarized substrate layers. FETs having such a configuration exhibit improved values for, for example, transconductance and noise figure. RF circuits such as, for example, voltage controlled oscillators (“VCOs”), low noise amplifiers (“LNAs”), and phase locked loops (“PLLs”) built using these FETs also exhibit enhanced performance.


Find Patent Forward Citations

Braithwaite, Glyn. (2010). Rf circuits including transistors having strained material layers (U.S. Patent No. 7709828). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7709828

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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