The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Feb. 10, 2006
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Barberaz, FR;
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Tadahiro Ishizaka, Waterlivet, NY (US);
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Barberaz, FR;
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Tadahiro Ishizaka, Waterlivet, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing the deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.