The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Jun. 14, 2006
Shih-ming Chang, Hsin-Chu, TW;
Wen-chuan Wang, Hsin-Chu, TW;
Chih-cheng Chin, Hsin-Chu, TW;
Chi-lun LU, Hsinchu, TW;
Sheng-chi Chin, Hsin-Chu, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Shih-Ming Chang, Hsin-Chu, TW;
Wen-Chuan Wang, Hsin-Chu, TW;
Chih-Cheng Chin, Hsin-Chu, TW;
Chi-Lun Lu, Hsinchu, TW;
Sheng-Chi Chin, Hsin-Chu, TW;
Hung Chang Hsieh, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Disclosed is a lithography system. The lithography system includes a source designed to provide energy; an imaging system configured to direct the energy onto a substrate to form a predefined image thereon, and defining an optical axis; and an aperture incorporated with the imaging system, the aperture having a plurality of transmitting regions defined along radial axis not parallel to the optical axis, and each transmitting region operable to transmit the energy with adjustable intensity.