The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2010

Filed:

Sep. 29, 2006
Applicants:

Svetlana B. Radovanov, Marblehead, MA (US);

Peter L. Kellerman, Essex, MA (US);

Victor M. Benveniste, Gloucester, MA (US);

Robert C. Lindberg, Rockport, MA (US);

Kenneth H. Purser, Lexington, MA (US);

Tyler B. Rockwell, Wakefield, MA (US);

James S. Buff, Brookline, NH (US);

Anthony Renau, West Newbury, MA (US);

Inventors:

Svetlana B. Radovanov, Marblehead, MA (US);

Peter L. Kellerman, Essex, MA (US);

Victor M. Benveniste, Gloucester, MA (US);

Robert C. Lindberg, Rockport, MA (US);

Kenneth H. Purser, Lexington, MA (US);

Tyler B. Rockwell, Wakefield, MA (US);

James S. Buff, Brookline, NH (US);

Anthony Renau, West Newbury, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/10 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
Abstract

A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.


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