The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Dec. 31, 2007
Applicants:

Tung-hsing Lee, Taipei County, TW;

Ming-tzong Yang, Hsinchu County, TW;

Tao Cheng, Hsinchu, TW;

Ching-chung Ko, Hsinchu County, TW;

Tien-chang Chang, Hsinchu, TW;

Yu-tung Chang, Hsinchu, TW;

Inventors:

Tung-Hsing Lee, Taipei County, TW;

Ming-Tzong Yang, Hsinchu County, TW;

Tao Cheng, Hsinchu, TW;

Ching-Chung Ko, Hsinchu County, TW;

Tien-Chang Chang, Hsinchu, TW;

Yu-Tung Chang, Hsinchu, TW;

Assignee:

Mediatek Inc., Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device with dummy patterns for alleviating micro-loading effect includes a semiconductor substrate having thereon a middle annular region between an inner region and an outer region; a SiGe device on the semiconductor substrate within the inner region; and a plurality of dummy patterns provided on the semiconductor substrate within the middle annular region. At least one of the dummy patterns contains SiGe.


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