The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Nov. 30, 2005
Takuya Sugawara, Santa Clara, CA (US);
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Shigeru Nakajima, Nirasaki, JP;
Tomonori Fujiwara, Nirasaki, JP;
Takuya Sugawara, Santa Clara, CA (US);
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Shigeru Nakajima, Nirasaki, JP;
Tomonori Fujiwara, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An insulting film is modified by subjecting the insulting film to a modification treatment comprising a combination of a plasma treatment and a thermal annealing treatment. There is provided a method of enhancing the characteristic of an insulating film by improving deterioration in the characteristic of the insulating film due to carbon, a suboxide, a dangling bond or the like contained in the insulating film.